1. With high cathode efficiency, it may be up to 23%-26%.
2. The current density even over 60A/dm2 is available.
3. The deposition speed for KCR-25 bath is 2-3 times faster than conventional hard chromium process.
4. It is chloride-free, the KCR-25 process dose not cause erosion of the workpiece in low current density area.
5. The micro-hardness of the plating is up to 950HV-1100HV100.
6. The amount of the micro cracks of the plating may be up to 400/cm, so it improves the corrosion resistance ability of the plating.
Bath composition & Operation condition
| Operation range | Standard |
Chromium trioxide | 200~275g/L | 250g/L |
KCR-25 Catalyst |
| 20ml/L |
Sulfuric acid | 2.5~4g/L | 2.7g/L |
Temperature | 50~60℃ | 58℃ |
Cathode current density(Dk) | 50~75A/dm2 | 60A/dm2 |
Anodic current density | 15~30A/dm2 | 30A/dm2
|